Structure and magnetism of Fe/Si multilayers grown by ion-beam sputtering

被引:128
作者
Chaiken, A
Michel, RP
Wall, MA
机构
[1] Materials Science and Technology Division, Lawrence Livermore National Laboratory, Livermore
来源
PHYSICAL REVIEW B | 1996年 / 53卷 / 09期
关键词
D O I
10.1103/PhysRevB.53.5518
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Ion-beam sputtering has been used to prepare Fe/Si multilayers on a variety of substrates and over a wide range of temperatures. Small-angle x-ray-diffraction and transmission electron microscopy experiments show that the layers are heavily intermixed although a composition gradient is maintained. When the spacer layer is an amorphous iron silicide, the magnetic properties of the multilayers are similar to those of bulk Fe. When the spacer layer is a crystalline silicide with the B2 or DO3 structure, the multilayers show antiferromagnetic interlayer coupling like that observed in ferromagnet/paramagnet multilayers such as Fe/Cr and Co/Cu. Depending on the substrate type and the growth temperature, the multilayers grow in either the (011) or (001) texture. The occurrence of the antiferromagnetic interlayer coupling is dependent on the crystallinity of the iron and iron silicide layers, but does not seem to be strongly affected by the perfection of the layering or the orientation of the film. Since the B2- and DO3-structure FexSi1-x compounds are known to be metallic, antiferromagnetic interlayer coupling in Fe/Si multilayers probably originates from the same quantum-well and Fermi surface effects as in Fe/Cr and Co/Cu multilayers.
引用
收藏
页码:5518 / 5529
页数:12
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