Observation of rapid solidification of deeply undercooled Si melts using electrostatic levitation

被引:12
作者
Aoyama, T [1 ]
Paradis, PF [1 ]
Ishikawa, T [1 ]
Yoda, S [1 ]
机构
[1] Tsukuba Space Ctr, Natl Space Dev Agcy Japan, Tsukuba, Ibaraki 3058505, Japan
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2004年 / 375卷 / 1-2 SPEC. ISS.期
关键词
silicon; electrostatic levitator; undercooling; growth velocity;
D O I
10.1016/j.msea.2003.10.031
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Pure Si samples with diameters of about 1.7 mm were undercooled down to 317 K while electrostatically levitated. The crystal growth velocities were measured as a function of undercooling and the appearance of the solid/liquid interface was observed by means of a high-speed camera. The results were compared with those reported previously for larger Si droplets using an electromagnetic levitator. In this study, nucleation was triggered at a given undercooling using needle darting and particle interspersing. As a new finding, the transition of growth mechanism from a single plate to multi-plate crystal was observed at the undercooling of 80 K. Transitions from plate-like crystal to coarse faceted dendrite and from coarse to fine faceted dendrite hardly depended on the sample size. (C) 2003 Published by Elsevier B.V.
引用
收藏
页码:460 / 463
页数:4
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