Thickness measurements by quartz microbalance during thin-film growth by organic-molecular-beam deposition

被引：21

作者：

Campione, M

Cartotti, M

Pinotti, E

Sassella, A

Borghesi, A

机构：

[1] INFM, I-20125 Milan, Italy

[2] Univ Milano Bicocca, Dipartimento Sci Mat, I-20125 Milan, Italy

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 2004年 / 22卷 / 03期

关键词：

D O I：

10.1116/1.1690249

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The problem of in situ monitoring the film thickness by quartz microbalance during vacuum deposition of organic-molecular semiconductors is addressed herein by setting a procedure for sensor calibration based on ex situ analysis of the deposited molecular film by atomic-force microscopy measurements. The procedure is applied to the growth of molecular-organic thin films on silica. Some physical parameters of the materials are deduced. (C) 2004 American Vacuum Society.

引用

页码：482 / 486

页数：5

共 11 条

[1]

[Anonymous], 1998, ELECT MAT OLIGOMER A

[2]

Barabasi A.-L., 1995, FRACTAL CONCEPTS SUR, DOI [10.1017/CBO9780511599798, DOI 10.1017/CBO9780511599798]

[3] MOLECULAR SOLID SOLUTION OF TETRAPHENYLPORPHIN AND SILVER TETRAPHENYLPORPHIN [J].