Texture development in thin films

被引:30
作者
Lee, DN [1 ]
机构
[1] Seoul Natl Univ, Sch Mat Sci & Engn, Seoul 151744, South Korea
来源
TEXTURES OF MATERIALS, PTS 1 AND 2 | 2002年 / 408-4卷
关键词
Al; Co-Cr; Cr; Cr electrodeposits; Cu; deposition textures; electroless Ni alloy deposits; Fe; growth textures; Mo; Ni; recrystallization textures; Ti; TiN; vapor deposits of Ag; ZnO;
D O I
10.4028/www.scientific.net/MSF.408-412.75
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A model for the formation of the crystallographic texture which can be applied to deposits obtained by physical and chemical vapor deposition, electrodeposition, and electroless-deposition is described. When the deposits are annealed, the deposits undergo recrystallization or abnormal grain-growth to reduce their energy stored during deposition. The driving force for recrystallization is mainly due to dislocations, whereas that for abnormal grain growth is due to the grain boundary energy, the surface energy or the strain energy, or their combinations. During recrystallization and abnormal grain growth, the texture change can take place. Models for the formation of recrystallization and abnormal grain growth textures are also discussed.
引用
收藏
页码:75 / 94
页数:20
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