Step and repeat UV nanoimprint lithography tools and processes

被引：84

作者：

McMackin, I ^{[1
]}

Choi, J ^{[1
]}

Schumaker, P ^{[1
]}

Nguyen, V ^{[1
]}

Xu, F ^{[1
]}

Thompson, E ^{[1
]}

Babbs, D ^{[1
]}

Sreenivasan, SV ^{[1
]}

Watts, M ^{[1
]}

Schumaker, N ^{[1
]}

机构：

[1] Mol Imprints Inc, Austin, TX 78758 USA

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES VIII | 2004年 / 5374卷

关键词：

D O I：

10.1117/12.538733

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Step and Flash(TM) Imprint Lithography (S-FIL(TM)) process is a step and repeat nano-replication technique based on UV curable low viscosity liquids. Molecular Imprints, Inc. (MII) develops commercial tools that practice the S-FIL process. The current status of the S-FIL tool and process technology is presented in this paper. The specific topics that are covered include: Residual layer control Etch process development Patterning of lines, contacts and posts CD control Defect and process life Alignment and magnification control.

引用

页码：222 / 231

页数：10

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