Effects of substrate surface functionality on solution-deposited titania films

被引：112

作者：

Pizem, H

Sukenik, CN

机构：

[1] Case Western Reserve Univ, Dept Mat Sci & Engn, Cleveland, OH 44106 USA

[2] Bar Ilan Univ, Dept Chem, Ramat Gan, Israel

来源：

CHEMISTRY OF MATERIALS | 2002年 / 14卷 / 06期

关键词：

D O I：

10.1021/cm010776e

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Liquid-phase deposition (LPD) from aqueous solution, under mild conditions of temperature (less than or equal to55 degreesC) and PH (2.88-3.88), can produce thin (0.1-1.0 mum), adherent titania (TiO2) films. This paper reports a systematic study of LPD TiO2 films on variously prepared silicon wafer substrates, including (to our knowledge for the first time with LPD) several types of sulfonated surfaces (including sulfonated self-assembled monolayers and sulfonated polyelectrolyte multilayers). The growth rate and crystallinity of these films could be controlled by careful manipulation of solution parameters and surface functionality of the substrate.

引用

收藏

页码：2476 / 2485

页数：10

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