Low temperature deposition of patterned TiO2 thin films using photopatterned self-assembled monolayers

Patterned thin films of TiO2 were deposited from aqueous solution onto photopatterned self-assembled monolayer (SAM) films on Si substrates. Regions of the SAM containing sulfonate surface functionality were created by the photo-oxidation of initially deposited thioacetate groups through a mask. The nanocrystalline TiO2-on-SAM films were deposited selectively on the photolyzed regions of the SAM. The electrical properties of such films were assessed for potential microelectronic device applications. Current-voltage and capacitance-voltage measurements made on nonpatterned TiO2 films yielded values of relative permittivity ranging from 24 to 57, film resistivities of 1.0-1.5x10(9) Omega cm and breakdown voltages in excess of 1 MV/cm. (C) 1996 American Institute of Physics.