SiC studied via LEEN and cathodoluminescence spectroscopy

被引:3
作者
Brillson, LJ [1 ]
Tumakha, S
Okojie, RS
Zhang, M
Pirouz, P
机构
[1] Ohio State Univ, Dreese Lab 205, Columbus, OH 43210 USA
[2] NASA, Glenn Res Ctr, Cleveland, OH 44135 USA
[3] Case Western Reserve Univ, Dept Mat Sci & Engn, Cleveland, OH 44106 USA
来源
SILICON CARBIDE AND RELATED MATERIALS 2003, PTS 1 AND 2 | 2004年 / 457-460卷
关键词
luminescence spectroscopy; nanoscale; metal-SiC interface; defect; polytype; stacking fault;
D O I
10.4028/www.scientific.net/MSF.457-460.543
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have used low energy electron-excited nanoscale (LEEN) luminescence spectroscopy, a low energy variant of cathodoluminescence spectroscopy, to measure localized states at 4H- and 6H SiC surfaces and interfaces. Both discrete and continuum states appear across the band gap that depend sensitively on surface chemical treatment, thermal processing, or metallization. These localized states form not only as a result of interface chemical bonding but also due to the formation of new local structures/polytypes. Luminescence measurements reveal a striking polytype change of 4H- to 3C-SiC in quantum-scale transformation bands activated by high temperature thermal annealing and high n-type doping. Deep level correlations with Schottky barriers highlight the importance of interface chemical as well as structural interactions.
引用
收藏
页码:543 / 548
页数:6
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