CdO epitaxial layers grown on (001) GaAs surfaces by metalorganic molecular-beam epitaxy

被引:18
作者
Ashrafi, ABMA
Kumano, H
Suemune, I
Ok, YW
Seong, TY
机构
[1] Hokkaido Univ, Optoelect Lab, Res Inst Elect Sci, Kita Ku, Sapporo, Hokkaido 0600812, Japan
[2] Kwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 506712, South Korea
[3] Kwangju Inst Sci & Technol, Ctr Frontier Mat, Kwangju 506712, South Korea
关键词
crystal structure; surfaces; single crystal growth; oxides;
D O I
10.1016/S0022-0248(01)01956-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Atomically flat CdO thin layers were grown on GaAs(0 0 1) substrates with ZnS buffer layers. The grown layers were evaluated by reflection high-energy electron diffraction (RHEED), atomic force microscopy (AFM), X-ray rocking curve (XRC), and transmission electron diffraction (TED) measurements. The RHEED observations of CdO thin layers showed two-dimensional growth mode revealed by streaky patterns with excellent homogeneity through [1 1 0] and [1̄ 1 0] directions. This streaky pattern is the reflection of the flat surface morphology in atomic level assessed by AFM measurements with the surface root mean square roughness of ∼ 1 nm. The crystalline structure as well as quality of the thin CdO layers was investigated by X-ray diffraction and XRC measurements which indicated the single-crystalline rocksalt CdO thin layers with minimum full-width at half maximum under the optimal growth condition. The TED observation showed the epitaxial relationship between the rocksalt CdO and zincblende GaAs substrate as [1 1 0]CdO∥[1 1 0]GaAs, [1 1̄ 0]CdO∥[1 1̄ 0]GaAs, and [0 0 1]CdO∥[0 0 1]GaAs. © 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:518 / 522
页数:5
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