Fabrication of metal nanocrystalline films by gas-deposition method

Ni nanocrystalline films were prepared by using a gas-deposition method under various conditions. From the results of a scanning electron microscopy and an atomic force microscopy study, small particles (similar to 10 nm in diameter) were observed as well as their aggregates. The less aggregation and the lower coercivity are realized with the lower evaporation temperature and the higher pressure in tile evaporation chamber. The evaporation rates are clearly dependent on the evaporation temperature, however, the particle sizes are almost independent of it.