Fabrication of planar gratings by direct ablation using an ultrashort pulse laser in a common optical path configuration

Planar gratings have wide applications and to date, many methods for the fabrication of gratings have been reported. Ultrashort pulse lasers have been used for the machining of gratings primarily because they allow direct ablation and the manufacturing of sub-wavelength structures. In this paper, we present a novel direct ablation technique for the fabrication of planar gratings which makes use of the interference of ultrashort pulses in a common optical path configuration. This technique of grating fabrication not only simplifies the optical setup, but also immunizes the system to extraneous and inherent vibrations, thus enabling the manufacturing of planar gratings of good edge acuity. We have successfully fabricated planar gratings on a copper substrate.