Aromatic monoazines as fluorescent sensors for photoacid generation in thin polymer films

被引:35
作者
Pohlers, G
Virdee, S
Scaiano, JC
Sinta, R
机构
[1] UNIV OTTAWA,DEPT CHEM,OTTAWA,ON K1N 6N5,CANADA
[2] SHIPLEY CO INC,RES & DEV LABS,MARLBOROUGH,MA 01752
关键词
D O I
10.1021/cm960186u
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
This paper reports a novel approach to monitor photoinduced acid generation in polymer films of the type used in microlithography. We have employed fluorescent acid-sensitive sensors to monitor the progress of photoacid generation in solution and in thin polymer films. We have studied the effect of p-toluenesulfonic acid on the spectral propepties of 2-phenylpyridine, 2-phenylquinoline, and acridine in diglyme solution and in poly(methyl methacrylate) (PMMA) films using absorption and fluorescence spectroscopy. In both cases a bathochromic spectral shift and an increase in fluorescence quantum yield are observed upon protonation. In samples containing a photoacid generator, the acid production upon irradiation could be monitored by observing the increase in fluorescence intensity with proceeding irradiation time in both solution and PMMA films. This new acid-monitoring method may find application in the study of diffusional processes in polymer films.
引用
收藏
页码:2654 / 2658
页数:5
相关论文
共 20 条
[1]   HYDROGEN BONDING OF EXCITED STATES [J].
BOWEN, EJ ;
HOLDER, NJ ;
WOODGER, GB .
JOURNAL OF PHYSICAL CHEMISTRY, 1962, 66 (12) :2491-&
[2]  
Bu''nau G. v., 1970, RANG DALESPHARMACOLO, V74, P1294, DOI [10.1002/bbpc.19700741223, DOI 10.1002/BBPC.19700741223]
[3]   OPTICAL SENSORS FOR HIGH ACIDITIES BASED ON FLUORESCENT POLYMERS [J].
CAREY, WP ;
JORGENSEN, BS .
APPLIED SPECTROSCOPY, 1991, 45 (05) :834-838
[4]  
DAMMEL R, 1986, MICROELECTRON ENG, V5, P97
[5]   SUBNANOSECOND TIME-RESOLVED FLUORESCENCE OF ACRIDINE IN SOLUTION [J].
DIVERDI, LA ;
TOPP, MR .
JOURNAL OF PHYSICAL CHEMISTRY, 1984, 88 (16) :3447-3451
[6]   THE ROLE OF THE LATENT IMAGE IN A NEW DUAL IMAGE, AQUEOUS DEVELOPABLE, THERMALLY STABLE PHOTORESIST [J].
FEELY, WE ;
IMHOF, JC ;
STEIN, CM .
POLYMER ENGINEERING AND SCIENCE, 1986, 26 (16) :1101-1104
[7]   CHEMICALLY AMPLIFIED IMAGING MATERIALS BASED ON ELECTROPHILIC AROMATIC-SUBSTITUTION - POLY[4-(ACETOXYMETHYL)STYRENE-CO-4-HYDROXYSTYRENE] [J].
FRECHET, JMJ ;
MATUSZCZAK, S ;
RECK, B ;
STOVER, HDH ;
WILLSON, CG .
MACROMOLECULES, 1991, 24 (08) :1746-1754
[8]   POLY(PARA-TERT-BUTOXYCARBONYLOXYSTYRENE) - A CONVENIENT PRECURSOR TO PARA-HYDROXYSTYRENE RESINS [J].
FRECHET, JMJ ;
EICHLER, E ;
ITO, H ;
WILLSON, CG .
POLYMER, 1983, 24 (08) :995-1000
[9]   CHEMICAL AMPLIFICATION IN THE DESIGN OF DRY DEVELOPING RESIST MATERIALS [J].
ITO, H ;
WILLSON, CG .
POLYMER ENGINEERING AND SCIENCE, 1983, 23 (18) :1012-1018
[10]   RELAXATION MECHANISM OF EXCITED ACRIDINE IN NON-REACTIVE SOLVENTS [J].
KASAMA, K ;
KIKUCHI, K ;
YAMAMOTO, S ;
UJIIE, K ;
NISHIDA, Y ;
KOKUBUN, H .
JOURNAL OF PHYSICAL CHEMISTRY, 1981, 85 (10) :1291-1296