Transparent, conductive CuI films prepared by rf-dc coupled magnetron sputtering

被引：84

作者：

Tanaka, T ^{[1
]}

Kawabata, K ^{[1
]}

Hirose, M ^{[1
]}

机构：

[1] HIROSHIMA UNIV, DEPT ELECT ENGN, HIGASHIHIROSHIMA 724, JAPAN

来源：

THIN SOLID FILMS | 1996年 / 281卷

关键词：

copper; sputtering; X-ray photoelectron spectroscopy;

D O I：

10.1016/0040-6090(96)08607-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Optically transparent, conducting CuI films have been prepared by a magnetron sputtering technique which employs rf and dc target biases. It is shown that the stoichiometric CuI films are obtained at the target bias V-T=-200 V, while the lowest resistivity of 5.4X10(-2) Ohm cm and the best optical transmittance of about 70% over the wavelength range 500 to 1000 nm are obtained at V-T=-50 V where the I/Cu ratio is 0.9.

引用

页码：179 / 181

页数：3

共 10 条

[1]

FUJIKAKE S, 1990, PVSEC5, P623

[2] TRANSPARENT AND HIGHLY CONDUCTIVE FILMS OF ZNO PREPARED BY RF SPUTTERING [J].

ITO, K ;

NAKAZAWA, T .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L245-L247

[3]

KADONO K, 1991, PHYS CHEM GLASSES, V32, P207

[4]

KATAYAMA M, 1988, SID 88, P310

[5] PREPARATION OF W AND MO THIN-FILMS BY RF-DC COUPLED MAGNETRON SPUTTERING [J].

KAWABATA, K ;

TANAKA, T ;

KAJIOKA, H .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1993, 163 (02) :163-165

[6]

Kawabata K, 1993, J VAC SOC JPN, V36, P144

[7]

MADELUNG O, 1992, DATA SCI TECHNOLOGY, P15

[8] HIGHLY CONDUCTIVE AND TRANSPARENT ALUMINUM DOPED ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING [J].

MINAMI, T ;

NANTO, H ;

TAKATA, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1984, 23 (05) :L280-L282

[9]

NOSAKA T, 1992, J VAC SOC JPN, V35, P150

[10]

SATO K, 1990, PVSEC5, P1032

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