HIGHLY CONDUCTIVE AND TRANSPARENT ALUMINUM DOPED ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING

被引：451

作者：

MINAMI, T

NANTO, H

TAKATA, S

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1984年 / 23卷 / 05期

关键词：

D O I：

10.1143/JJAP.23.L280

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：L280 / L282

页数：3

共 7 条

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[2] HIGHLY CONDUCTIVE AND TRANSPARENT ZINC-OXIDE FILMS PREPARED BY RF MAGNETRON SPUTTERING UNDER AN APPLIED EXTERNAL MAGNETIC-FIELD [J].

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APPLIED PHYSICS LETTERS, 1982, 41 (10) :958-960

[3] THE STABILITY OF ZINC-OXIDE TRANSPARENT ELECTRODES FABRICATED BY RF MAGNETRON SPUTTERING [J].

MINAMI, T ;

NANTO, H ;

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THIN SOLID FILMS, 1984, 111 (02) :167-174

[4] ELECTRICAL AND OPTICAL-PROPERTIES OF ZINC-OXIDE THIN-FILMS PREPARED BY RF MAGNETRON SPUTTERING FOR TRANSPARENT ELECTRODE APPLICATIONS [J].

NANTO, H ;

MINAMI, T ;

SHOOJI, S ;

TAKATA, S .

JOURNAL OF APPLIED PHYSICS, 1984, 55 (04) :1029-1034

[5]

NAYER PS, 1981, APPL PHYS LETT, V39, P105

[6] ABSORPTION-EDGE SHIFT IN ZNO THIN-FILMS AT HIGH CARRIER DENSITIES [J].

ROTH, AP ;

WEBB, JB ;

WILLIAMS, DF .

SOLID STATE COMMUNICATIONS, 1981, 39 (12) :1269-1271

[7] TRANSPARENT AND HIGHLY CONDUCTIVE FILMS OF ZNO PREPARED BY RF REACTIVE MAGNETRON SPUTTERING [J].

WEBB, JB ;

WILLIAMS, DF ;

BUCHANAN, M .

APPLIED PHYSICS LETTERS, 1981, 39 (08) :640-642

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