Structural and electrical properties of sputtered vanadium oxide thin films for applications as gas sensing material

被引：60

作者：

Manno, D ^{[1
]}

Serra, A ^{[1
]}

DiGiulio, M ^{[1
]}

Micocci, G ^{[1
]}

Taurino, A ^{[1
]}

Tepore, A ^{[1
]}

Berti, D ^{[1
]}

机构：

[1] ENIRICERCHE SPA,I-20097 SAN DONATO MILANE,MILANO,ITALY

来源：

JOURNAL OF APPLIED PHYSICS | 1997年 / 81卷 / 06期

关键词：

V2O5;

D O I：

10.1063/1.363973

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A detailed structural and morphological investigation has been carried out by conventional transmission electron microscopy, high resolution electron microscopy and nanodiffraction methods on vanadium oxide films obtained by reactive rf sputter at a high power discharge (1000 W) and different O-2/Ar ratio. Electrical characterization has been also performed in controlled atmosphere in order to investigate the influence of NO2 oxidizing gas on the material conductance as a function of deposition parameters. A strict relation between structure, morphology and resistance variation in controlled atmosphere has been observed. (C) 1997 American Institute of Physics.

引用

页码：2709 / 2714

页数：6

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