Perpendicular exchange bias in antiferromagnetic-ferromagnetic nanostructures

被引：70

作者：

Sort, J

Dieny, B

Fraune, M

Koenig, C

Lunnebach, F

Beschoten, B

Güntherodt, G

机构：

[1] CEA Grenoble, CNRS, URA 2512, SPINTEC, F-38054 Grenoble 9, France

[2] Rhein Westfal TH Aachen, Inst Phys 2, D-52056 Aachen, Germany

来源：

APPLIED PHYSICS LETTERS | 2004年 / 84卷 / 18期

关键词：

D O I：

10.1063/1.1737484

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Exchange bias effects have been induced along the perpendicular-to-film direction in nanostructures prepared by electron beam lithography, consisting of a ferromagnetic [Pt/Co] multilayer exchange coupled to an antiferromagnet (FeMn). As a general trend, the exchange bias field and the blocking temperature decrease, whereas the coercivity increases, as the size of the nanostructures is reduced. (C) 2004 American Institute of Physics.

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页码：3696 / 3698

页数：3

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