Planar thin film YBa2Cu3O7-δ Josephson junction pairs and arrays via nanolithography and ion damage

被引：32

作者：

Chen, K ^{[1
]}

Cybart, SA ^{[1
]}

Dynes, RC ^{[1
]}

机构：

[1] Univ Calif San Diego, La Jolla, CA 92093 USA

来源：

APPLIED PHYSICS LETTERS | 2004年 / 85卷 / 14期

关键词：

D O I：

10.1063/1.1803620

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We have fabricated in-plane high-T-c Josephson junction pairs and series arrays using our established nanolithography and ion damage process. Junctions in a pair showed nearly identical electrical properties. The ten-junction array exhibited current-voltage characteristics that can be described by the resistively shunted junction model at 78 K. Flat giant Shapiro steps were observed in both cases. We believe that the ion-damaged high-T-c superconducting Josephson junction is a good candidate to form large numbers of junctions in series arrays that can function above 77 K for quantum voltage standards and other applications. (C) 2004 American Institute of Physics.

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页码：2863 / 2865

页数：3

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