Materials issues for optical components and photomasks in 157 nm lithography

被引:62
作者
Liberman, V
Bloomstein, TM
Rothschild, M
Sedlacek, JHC
Uttaro, RS
Bates, AK
Van Peski, C
Orvek, K
机构
[1] MIT, Lincoln Lab, Lexington, MA 02420 USA
[2] SEMATECH, IBM, Austin, TX 78741 USA
[3] SEMATECH, Austin, TX 78741 USA
[4] Intel Corp, Santa Clara, CA 95054 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期
关键词
D O I
10.1116/1.590994
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Photolithography using 157 nm pulsed fluorine lasers has emerged as the leading candidate technology for the post-193-nm generation. Preliminary data have indicated that at 157 nm there are optical materials transparent enough to enable the fabrication of refractive elements, both in the projection and illumination part of the optical train. However, a number of critical issues still remain. Optical materials must show no appreciable degradation with laser irradiation. The availability of transparent photomask substrates must be ascertained. Optical coatings must be developed and qualified. At this short wavelength, interface effects, subsurface damage, and adsorbate effects become increasingly prominent. We present recent experimental results on the durability tests of calcium fluoride, modified fused silica, and optical coatings for 157 nm applications. Our initial assessment of several grades of modified fused silica demonstrates that at least one grade already meets transparency and durability requirements for reticle substrates for 157 nm applications. For both bulk calcium fluoride and antireflectance coatings our tests to date show no degradation for 300 million pulses at fluences up to 3 mJ/cm(2)/pulse. We do observe degradation of beam steering mirrors in our experimental setup. Detailed damage analysis of these coatings is presented. (C) 1999 American Vacuum Society. [S0734-211X(99)19606-9].
引用
收藏
页码:3273 / 3279
页数:7
相关论文
共 18 条
[1]  
BURNETT J, IDEX NATL I SCI TECH
[2]   Thermomechanical distortions of advanced optical reticles during exposure [J].
Chang, J ;
Abdo, A ;
Kim, B ;
Bloomstein, T ;
Engelstad, R ;
Lovell, E ;
Beekman, W ;
Mitchell, J .
EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :756-767
[3]   AN ATOMIC-FLUORINE LASER PUMPED BY CHARGE-TRANSFER FROM HE-2+ AT HIGH-PRESSURES [J].
COLLINS, CB ;
LEE, FW ;
CARROLL, JM .
APPLIED PHYSICS LETTERS, 1980, 37 (10) :857-859
[4]   TEMPERATURE DISPERSION OF REFRACTIVE-INDEXES IN SOME SILICATE FIBER GLASSES [J].
GHOSH, G .
IEEE PHOTONICS TECHNOLOGY LETTERS, 1994, 6 (03) :431-433
[5]   EXCITON PHONON INTERACTION IN CRYSTALLINE AND VITREOUS SIO2 [J].
GODMANIS, IT ;
TRUKHIN, AN ;
HUBNER, K .
PHYSICA STATUS SOLIDI B-BASIC RESEARCH, 1983, 116 (01) :279-287
[6]  
HACHFELD K, UNPUB
[7]  
HOFFMAN T, 1999, P SOC PHOTO-OPT INS, V3679, P541
[8]   STRUCTURE OF THIN FLUORIDE FILMS DEPOSITED ON AMORPHOUS SUBSTRATES [J].
KAISER, U ;
KAISER, N ;
WEISSBRODT, P ;
MADEMANN, U ;
HACKER, E ;
MULLER, H .
THIN SOLID FILMS, 1992, 217 (1-2) :7-16
[9]   VACUUM ULTRAVIOLET REFRACTIVE-INDEX OF LIF AND MGF2 IN THE TEMPERATURE-RANGE 80-300-K [J].
LAPORTE, P ;
SUBTIL, JL ;
COURBON, M ;
BON, M ;
VINCENT, L .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1983, 73 (08) :1062-1069