Nanoindentation and birefringence measurements on fused silica specimen exposed to low-energy femtosecond pulses

被引:68
作者
Bellouard, Yves
Colomb, Tristan
Depeursinge, Christian
Dugan, Mark
Said, Ali A.
Bado, Philippe
机构
[1] Eindhoven Univ Technol, Dept Mech Engn, NL-5600 MB Eindhoven, Netherlands
[2] Ecole Polytech Fed Lausanne, LOA, STI, IOA,Stn 17, CH-1015 Lausanne, Switzerland
[3] Translume Inc, Ann Arbor, MI 48108 USA
关键词
D O I
10.1364/OE.14.008360
中图分类号
O43 [光学];
学科分类号
070207 [光学]; 0803 [光学工程];
摘要
Femtosecond laser pulses used in a regime below the ablation threshold have two noticeable effects on Fused Silica (alpha-SiO2): they locally increase the material refractive index and modify its HF etching selectivity. The nature of the structural changes induced by femtosecond laser pulses in fused silica is not fully understood. In this paper, we report on nanoindentation and birefringence measurements on fused silica exposed to low-energy femtosecond laser pulses. Our findings further back the hypothesis of localized densification effect even at low energy regime. (c) 2006 Optical Society of America
引用
收藏
页码:8360 / 8366
页数:7
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