Morphological characteristics of Ni sulfides fabricated by chemical vapor deposition

被引：6

作者：

Cho, Gyu-bong ^{[1
,2
]}

Bae, Kang-woo ^{[1
,2
]}

Nam, Tae-hyun ^{[1
,2
]}

Lee, Jun-hee ^{[3
]}

机构：

[1] Gyeongsang Natl Univ, Sch Mat Sci & Engn, Jinju 660701, Gyeongnam, South Korea

[2] Gyeongsang Natl Univ, ERI, Jinju 660701, Gyeongnam, South Korea

[3] Dong A Univ, Dept Mat Sci & Engn, Donga, South Korea

来源：

JOURNAL OF ALLOYS AND COMPOUNDS | 2009年 / 477卷 / 1-2期

关键词：

CVD; Ni sulfides; Morphology; Electrochemical reaction; NICKEL SULFIDE; CATALYSTS;

D O I：

10.1016/j.jallcom.2008.10.128

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Ni sulfides were formed by reacting Ni substrates with gaseous sulfur, and then their microstructures were investigated. Ni sulfides consisted of four distinct layers, i.e., the topmost thin film layer (I), dense thick film layer (II), coarse particulate layer (III), and innermost fine particulate layer (IV). XRD and electrochemical analyses demonstrated that layers I, II and IV were NiS2, NiS and Ni3S2, respectively and layer III was a transient layer where Ni3S2 was converted into NiS by Ni3S2 + S -> NiS reaction. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：L24 / L27

页数：4

共 15 条

[1] Novel morphologies of nickel sulfides: nanotubes and nanoneedles derived from rolled nanosheets in a w/o microemulsion [J].