Tellurium desorption kinetics from (112) Si: Si-Te binding energy

被引:13
作者
Dhar, NK
Goldsman, N
Wood, CEC
机构
[1] USA, Res Lab, Adelphi, MD 20783 USA
[2] Univ Maryland, College Pk, MD 20742 USA
[3] Off Naval Res, Arlington, VA 22217 USA
来源
PHYSICAL REVIEW B | 2000年 / 61卷 / 12期
关键词
D O I
10.1103/PhysRevB.61.8256
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Transition-state theory was employed to model the tellurium adsorption characteristics and to evaluate Te-Si binding energy on a (112) Si surface. Isothermal desorption measurements of tellurium adsorbate-yielded rate parameters for the thermodynamic activation energies of adsorption and desorption. Quantitative surface analyses were made by auger electron spectroscopy and by temperature-programmed desorption mass spectrometry. The experimental rate constants for adsorption and desorption of tellurium from Si surfaces were used in the surface adsorption model. Our analyses suggested a second-order Te desorption mechanism and, upon chemisorption, the Te-Si surface binding energy calculation yielded a value of 3.46+/-0.1 eV.
引用
收藏
页码:8256 / 8261
页数:6
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