Band mapping of in situ Cs intercalated transition metal dichalcogenides

被引:8
作者
Brauer, HE
Starnberg, HI
Hughes, HP
Holleboom, LJ
机构
[1] GOTHENBURG UNIV, S-41296 GOTHENBURG, SWEDEN
[2] CAVENDISH LAB, CAMBRIDGE CH3 0HE, ENGLAND
[3] LUND UNIV, DEPT THEORET PHYS, S-22362 LUND, SWEDEN
关键词
angle resolved photoemission; compound formation; single crystal surfaces; surface electronic phenomena; transition metal dichalcogenides;
D O I
10.1016/0039-6028(96)00179-3
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The valence band structure of in situ Cs intercalated layered transition metal dichalcogenides has been studied with photoemission spectroscopy. The intercalation was achieved by room temperature deposition of Cs onto clean sample surfaces in UHV. The changes in the valence band structure upon intercalation were more extensive than predicted by the rigid band model, with the most profound change being a 3D-to-2D transition of the valence band. The band gaps of structurally similar and iso-electronic semiconducting samples were differently affected by the intercalation; in TiS2 the gap was significantly widened, while in ZrSe2 a slight decrease was observed. Very good overall agreement was found when comparing the experimental results with self-consistent LAPW band calculations.
引用
收藏
页码:345 / 349
页数:5
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