A particle transport study of vertical evaporation-driven colloidal deposition by the coffee-ring theory

被引：16

作者：

Diao, J. J. ^{[1
]}

Xia, M. G. ^{[2
]}

机构：

[1] Univ Illinois, Dept Phys, Urbana, IL 61801 USA

[2] Xi An Jiao Tong Univ, Ctr Expt Phys, Xian 710049, Shaanxi, Peoples R China

来源：

COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS | 2009年 / 338卷 / 1-3期

基金：

美国国家科学基金会;

关键词：

Self-assembly; Vertical evaporation-driven colloidal deposition; Colloidal particles; Film growth; Evaporation; Coffee ring; 2-DIMENSIONAL ARRAYS; FINE PARTICLES; CONTACT-ANGLE; CRYSTALS; FILMS; LINE; SUSPENSION; INTERFACE; SUBSTRATE; THICKNESS;

D O I：

10.1016/j.colsurfa.2008.12.030

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

In this paper, we present a theoretical discussion about colloidal particles transporting to a meniscus deposition region for the vertical evaporation-driven colloidal deposition by the coffee-ring theory. The vertically immersed Substrate is gradually exposed with a low speed, and colloidal particles are deposited on the substrate as suspension surface descends. Due to a singular evaporation rate at the contact line. to keep a constant contact angle, a solvent flow toward the meniscus region is formed to replenish lost liquid. This solvent flow results in a particle flow to form a film on the substrate. (C) 2008 Elsevier B.V. All rights reserved.

引用

页码：167 / 170

页数：4

共 27 条

[1] KINETICS OF LOCALIZED ADSORPTION OF COLLOID PARTICLES [J].