A particle transport study of vertical evaporation-driven colloidal deposition by the coffee-ring theory

被引:16
作者
Diao, J. J. [1 ]
Xia, M. G. [2 ]
机构
[1] Univ Illinois, Dept Phys, Urbana, IL 61801 USA
[2] Xi An Jiao Tong Univ, Ctr Expt Phys, Xian 710049, Shaanxi, Peoples R China
基金
美国国家科学基金会;
关键词
Self-assembly; Vertical evaporation-driven colloidal deposition; Colloidal particles; Film growth; Evaporation; Coffee ring; 2-DIMENSIONAL ARRAYS; FINE PARTICLES; CONTACT-ANGLE; CRYSTALS; FILMS; LINE; SUSPENSION; INTERFACE; SUBSTRATE; THICKNESS;
D O I
10.1016/j.colsurfa.2008.12.030
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this paper, we present a theoretical discussion about colloidal particles transporting to a meniscus deposition region for the vertical evaporation-driven colloidal deposition by the coffee-ring theory. The vertically immersed Substrate is gradually exposed with a low speed, and colloidal particles are deposited on the substrate as suspension surface descends. Due to a singular evaporation rate at the contact line. to keep a constant contact angle, a solvent flow toward the meniscus region is formed to replenish lost liquid. This solvent flow results in a particle flow to form a film on the substrate. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:167 / 170
页数:4
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