Microstructure and magnetic properties of Co/Pd multilayered thin films with C or Si seedlayer

被引:20
作者
Onoue, T
Asahi, T
Kuramochi, K
Kawaji, J
Osaka, T
Ariake, J
Ouchi, K
Sáfrán, G
Yaguchi, N
机构
[1] Waseda Univ, Adv Res Inst Sci & Engn, Shinjuku Ku, Tokyo 1698555, Japan
[2] Waseda Univ, Dept Appl Chem, Shinjuku Ku, Tokyo 1698555, Japan
[3] Akita Res Inst Adv Technol, Akita 0101623, Japan
[4] Hungarian Acad Sci, Res Inst Tech Phys & Mat Sci, Budapest 12, Hungary
[5] Hitachi Sci Syst, Techno Res Lab, Hitachinaka, Ibaragi 3128504, Japan
关键词
D O I
10.1063/1.1506420
中图分类号
O59 [应用物理学];
学科分类号
摘要
Microstructure and magnetic properties of sputter deposited Co/Pd multilayered perpendicular magnetization films with amorphous C or Si seedlayer were investigated. The angstrom scale surface roughness of the seedlayer causes fine crystal grains to form in the Co/Pd multilayer and to decrease the extent of intergranular exchange coupling, while it obstructs the formation of a regular interface between Co and Pd layers. The Si seedlayer, which exhibits a surface roughness lower than the C seedlayer, yields Co/Pd multilayered films with the lowest intergranular exchange coupling and the highest coercivity. The improvement in magnetic properties of the Co/Pd film with Si seedlayer is attributable mainly to the formation of Pd2Si at the interface between the Co/Pd layer and the Si seedlayer. The Pd2Si provides suitable nucleation sites for the grain growth of Co/Pd multilayered film that can be utilized as a perpendicular magnetic recording medium. (C) 2002 American Institute of Physics.
引用
收藏
页码:4545 / 4552
页数:8
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