Electron interactions with plasma processing gases:: An update for CF4, CHF3, C2F6, and C3F8

被引:158
作者
Christophorou, LG [1 ]
Olthoff, JK [1 ]
机构
[1] Natl Inst Stand & Technol, Div Elect, Elect & Elect Engn Lab, Gaithersburg, MD 20899 USA
关键词
attachment; CF4; C2F6; C3F8; CHF3; cross sections; dissociation; electron interactions; ionization; scattering; transport coefficients;
D O I
10.1063/1.556042
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
An update of electron-collision cross sections and electron transport parameters is presented for CF4, CHF3, C2F6, and C3F8. (C) 1999 American Institute of Physics and American Chemical Society. [S0047-2689(99)00104-X].
引用
收藏
页码:967 / 982
页数:16
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