Investigation of vapor-phase silica deposition on MCM-41, using tetraalkoxysilanes

被引：13

作者：

Fodor, K ^{[1
]}

Bitter, JH ^{[1
]}

de Jong, KP ^{[1
]}

机构：

[1] Univ Utrecht, Debye Inst, Dept Inorgan Chem & Catalysis, NL-3508 TB Utrecht, Netherlands

来源：

MICROPOROUS AND MESOPOROUS MATERIALS | 2002年 / 56卷 / 01期

关键词：

MCM-41; vapor-phase silica deposition; pore size tuning; tetraalkoxysilanes; template removal;

D O I：

10.1016/S1387-1811(02)00461-4

中图分类号：

O69 [应用化学];

学科分类号：

081704 ;

摘要：

Chemical vapor deposition of silica, using tetraalkoxysilanes, on mesoporous templated silica, MCM-41, resulted in ordered silica with pores on the borderline of mesoporous (2-50 nm) and microporous materials (<2 nm). The resulting materials were characterized by nitrogen and argon physisorption, XRD, transmission electron microscopy, thermogravimetric analysis and infrared spectroscopy. By tuning the deposition conditions the pore size of MCM-41 (approximate to3 nm) was gradually decreased to approximate to 2 nm. (C) 2002 Elsevier Science Inc. All rights reserved.

引用

页码：101 / 109

页数：9

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