Mechanisms of mound coarsening in unstable epitaxial growth

被引：51

作者：

Amar, JG ^{[1
]}

机构：

[1] Univ Toledo, Dept Phys & Astron, Toledo, OH 43606 USA

来源：

PHYSICAL REVIEW B | 1999年 / 60卷 / 16期

关键词：

D O I：

10.1103/PhysRevB.60.R11317

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Corner diffusion is shown to play a crucial role in determining the asymptotic mound coarsening exponent in in the case of unstable epitaxial growth on (001) and (111) surfaces. For the case of island-relaxation without corner diffusion the asymptotic exponent is found to satisfy n similar or equal to 1/4. However, when rapid corner-diffusion is allowed, the coarsening exponent is found to approach 1/3. An explanation for these results is presented in terms of the effects of corner diffusion on the surface current and mound morphology. [S0163-1829(99)51440-9].

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页码：11317 / 11320

页数：4

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