The interface of laser deposited Cu/Ag multilayers:: evidence of the 'subsurface growth mode' during pulsed laser deposition

被引:23
作者
Fähler, S [1 ]
Kahl, S [1 ]
Weisheit, M [1 ]
Sturm, K [1 ]
Krebs, HU [1 ]
机构
[1] Univ Gottingen, Inst Met Phys, D-37073 Gottingen, Germany
关键词
PLD; Cu/Ag multilayers; subsurface growth; resistance measurements; THEED;
D O I
10.1016/S0169-4332(99)00471-7
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Using Cu/Ag multilayers, we show that the deposition of a significant number of highly energetic ions, characteristic of pulsed laser deposition, leads to resputtering of the already-deposited film and implantation into the existing film. The consequent film growth is described by a 'subsurface growth mode', in which the material does not grow on top of the already-deposited film, but rather within the topmost few monolayers. This hypothesis is confirmed using three in situ diagnostic methods: rate monitoring which was found to exhibit a non-linearity at the beginning of each new layer, a result of resputtering of the growing film; resistance measurements showing a drop in conductance after beginning a new Cu layer, an effect attributed to implantation and alloying at the interface; and electron diffraction to determine the variation in lattice parameters during growth, which can be interpreted as a consequence of alloying. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:419 / 423
页数:5
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