An initial analysis of mechanisms leading to late stage abnormal grain growth in nanocrystalline Ni

被引：123

作者：

Hibbard, GD

McCrea, JL

Palumbo, G

Aust, KT

Erb, U

机构：

[1] Univ Toronto, Dept Mat Sci & Engn, Toronto, ON M5S 3E4, Canada

[2] Integran Technol Inc, Toronto, ON M9W 4Z6, Canada

来源：

SCRIPTA MATERIALIA | 2002年 / 47卷 / 02期

基金：

加拿大自然科学与工程研究理事会;

关键词：

grain growth; segregation; nickel; nanostructured materials;

D O I：

10.1016/S1359-6462(02)00098-2

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A late stage of abnormal grain growth, having unusual planar abnormal growth interfaces, is observed during the isothermal annealing of electrodeposited nanocrystalline Ni and Ni-Fe alloys. This communication presents observations of grain embedding and the presence of a wetting, sulfur-rich second phase at the abnormal growth interface and suggests a growth mechanism. (C) 2002 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.

引用

页码：83 / 87

页数：5

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