Thin-film morphology and Rutherford backscattering spectrometry

被引：4

作者：

Hahn, T ^{[1
]}

Metzner, H ^{[1
]}

Gossla, M ^{[1
]}

Conrad, J ^{[1
]}

机构：

[1] HAHN MEITNER INST BERLIN GMBH, ABT FD, D-14109 BERLIN, GERMANY

来源：

MATERIALS SCIENCE APPLICATIONS OF ION BEAM TECHNIQUES | 1997年 / 248-2卷

关键词：

Rutherford backscattering; surface morphology; scanning tunneling microscopy;

D O I：

10.4028/www.scientific.net/MSF.248-249.409

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this paper we present a new approach for the analysis of Rutherford backscattering spectra of thin films. The developed formalism allows, under some simplifying assumptions, the direct derivation of the height distribution of rough films. The advantages and limitations of this method compared to conventional methods of measuring the surface roughness are discussed.

引用

页码：409 / 412

页数：4

共 6 条

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