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Plasma immersion ion implantation of pure aluminium at elevated temperatures

被引：47
作者：
Blawert, C
Mordike, BL
机构：
[1] Inst. Werkstoffkunde W., Tech. Universität Clausthal, D-38678 Clausthal-Zellerfeld
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1997年 / 127卷
关键词：
Plasma Immersion Ion Implantation; aluminium; aluminium nitride; wear;
D O I：
10.1016/S0168-583X(97)00065-7
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
A thin nitride layer containing high amounts of oxygen is formed on the surface of A199.5 treated by Plasma Immersion Ion Implantation (PIII) at temperatures up to 500 degrees C. Below this layer, nitrogen is found in a diffusion zone several microns thick but does not form nitrides. The thickness of the diffusion zone is dependent on the treatment temperature. Microhardness measurements reveal a decrease in hardness due to a loss of work-hardening. In spite of this annealing, both the wear and corrosion resistance are improved.
引用
收藏
页码：873 / 878
页数：6
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