In situ Brewster angle microscopy and surface pressure studies on the interfacial growth of mesostructured silica thin films

被引：13

作者：

Edler, KJ ^{[1
]}

Roser, SJ

Mann, S

机构：

[1] Univ Bath, Dept Chem, Bath BA2 7AY, Avon, England

[2] Univ Bristol, Sch Chem, Bristol BS8 1TS, Avon, England

来源：

CHEMICAL COMMUNICATIONS | 2000年 / 09期

关键词：

D O I：

10.1039/b000375l

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Growth of a mesostructured silica thin film at the air/water interface was observed in situ using Brewster angle microscopy and surface pressure measurements allowing real time observation of nucleation of the film and its rapid growth to full surface coverage at the end of the induction period.

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收藏

页码：773 / 774

页数：2

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