IR and UV laser-induced photolysis of 2-chloroethenylsilane

被引：8

作者：

Castillejo, M ^{[1
]}

deNalda, R ^{[1
]}

Oujja, M ^{[1
]}

Diaz, L ^{[1
]}

Santos, M ^{[1
]}

机构：

[1] CSIC,INST ESTRUCTURA MAT,E-28006 MADRID,SPAIN

来源：

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 1997年 / 110卷 / 02期

关键词：

2-chloroethenylsilane; IR; laser-induced fluorescence; UV;

D O I：

10.1016/S1010-6030(97)00172-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The laser-induced decomposition of 2-chloroethenylsilane was studied in the IR with a TEA CO2 laser and in the UV with a narrow-band, frequency-doubled dye laser at 212.5 nm. Silylene was observed in the LR multiphoton dissociation (MPD) via laser-induced fluorescence (LIE). The nascent silylene fragments are vibrationally excited in the bending mode. Multiphoton UV photolysis yields a fluorescence emission spectrum originating from the SiH (A(2) Delta --> (XII)-I-2) Delta upsilon = 0 system, with several atomic Si transitions and molecular bands corresponding to C-2 (d(3)II(g) --> a(3)II(u)) Delta upsilon = 2, 1, 0, -1 and -2 transitions. The simulation of the spectra originating from diatomic fragments indicates that these possess a high content of internal energy, A high population of Si triplet states is observed. (C) 1997 Elsevier Science S.A.

引用

页码：107 / 113

页数：7

共 14 条

[1] GAS-PHASE KINETIC-STUDY OF THE PROTOTYPE SILYLENE ADDITION-REACTION SIH2+C2H4 OVER THE TEMPERATURE-RANGE 298-595-K - AN EXAMPLE OF A 3RD-BODY MEDIATED ASSOCIATION [J].