Thermal diffusivity in diamond, SiCxNy and BCxNy

被引：7

作者：

Chattopadhyay, S ^{[1
]}

Chien, SC

Chen, LC

Chen, KH

Lee, HY

机构：

[1] Natl Taiwan Univ, Ctr Condensed Matter Sci, Taipei 106, Taiwan

[2] Acad Sinica, Inst Atom & Mol Sci, Taipei 106, Taiwan

[3] Synchrotron Radiat Res Ctr, Div Res, Hsinchu, Taiwan

来源：

关键词：

thermal conductivity; microstructure; photoelectron spectroscopy; physical vapour deposition;

D O I：

10.1016/S0925-9635(01)00606-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Thermal diffusivity (alpha) of free standing diamond, amorphous silicon carbon nitride (a-SiCxNy) and boron carbon nitride (a-BCxNy) thin Films on crystalline silicon, has been studied using the travelling wave technique. Thermal diffusivity in all of them was found to depend on the microstructure. For a-SiCxNy and a-BCxNy thin films two distinct regimes of high and low carbon contents were observed in which the microstructure changed considerably and that has a profound effect on the thermal diffusivity. The defective C(sp)-N phase plays a key role in determining the film properties. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：708 / 713

页数：6

共 23 条

[1]

Badzian A. R., 1972, P 3 INT C CHEM VAP D, p[747, 3]

[2] Laser-induced chemical vapor deposition of nanostructured silicon carbonitride thin films [J].

Besling, WFA ;

Goossens, A ;

Meester, B ;

Schoonman, J .

JOURNAL OF APPLIED PHYSICS, 1998, 83 (01) :544-553

[3] Spectroscopic determination of the structure of amorphous nitrogenated carbon films [J].

Bhattacharyya, S ;

Cardinaud, C ;

Turban, G .

JOURNAL OF APPLIED PHYSICS, 1998, 83 (08) :4491-4500

[4] Traveling wave method for measurement of thermal conductivity of thin films [J].

Bhusari, DM ;

Teng, CW ;

Chen, KH ;

Wei, SL ;

Chen, LC .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1997, 68 (11) :4180-4183

[5] Optoelectronic and structural properties of good quality hydrogenated amorphous silicon carbide films deposited by hot wire assisted RF plasma deposition technique [J].

Chattopadhyay, S ;

Das, D ;

Barua, AK ;

Williamson, DL ;

Kshirsagar, ST .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (10) :5480-5484

[6] Thermal diffusivity in amorphous silicon carbon nitride thin films by the traveling wave technique [J].

Chattopadhyay, S ;

Chen, LC ;

Wu, CT ;

Chen, KH ;

Wu, JS ;

Chen, YF ;

Lehmann, G ;

Hess, P .

APPLIED PHYSICS LETTERS, 2001, 79 (03) :332-334

[7] Crystalline SiCN: a hard material rivals to cubic BN [J].

Chen, LC ;

Chen, KH ;

Wei, SL ;

Kichambare, PD ;

Wu, JJ ;

Lu, TR ;

Kuo, CT .

THIN SOLID FILMS, 1999, 355 :112-116

[8] THE THERMAL-CONDUCTIVITY OF CHEMICAL-VAPOR-DEPOSITED DIAMOND FILMS ON SILICON [J].

GRAEBNER, JE ;

MUCHA, JA ;

SEIBLES, L ;

KAMMLOTT, GW .

JOURNAL OF APPLIED PHYSICS, 1992, 71 (07) :3143-3146

[9] Interpretation of x-ray photoelectron spectra of elastic amorphous carbon nitride thin films [J].

Holloway, BC ;

Kraft, O ;

Shuh, DK ;

Kelly, MA ;

Nix, WD ;

Pianetta, P ;

Hagström, S .

APPLIED PHYSICS LETTERS, 1999, 74 (22) :3290-3292

[10] A METHOD OF MEASUREMENT OF THERMAL-CONDUCTIVITY - APPLICATION TO FREESTANDING DIAMOND SHEET [J].

KOSKY, PG .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1993, 64 (04) :1071-1075

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