Interpretation of x-ray photoelectron spectra of elastic amorphous carbon nitride thin films

被引:53
作者
Holloway, BC [1 ]
Kraft, O
Shuh, DK
Kelly, MA
Nix, WD
Pianetta, P
Hagström, S
机构
[1] Coll William & Mary, Dept Appl Sci, Williamsburg, VA 23187 USA
[2] Max Planck Inst Met Forsch, D-70174 Stuttgart, Germany
[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Div Chem Sci, Berkeley, CA 94720 USA
[4] Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
关键词
D O I
10.1063/1.123362
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the synthesis and characterization of amorphous carbon nitride (CNx) thin films using a direct current magnetron reactive sputter system. Nanoindentation of the CNx films and amorphous carbon films deposited under similar conditions shows the CNx films are extremely elastic, that the addition of nitrogen fundamentally changes the mechanical properties of the films, and that traditional methods of calculating the hardness and Young's modulus may not be valid. X-ray photoelectron spectroscopy (XPS) of the N(1s) and C(1s) core levels show multiple bonding arrangements. In a new interpretation of the XPS data, the two predominant N( 1s) spectral features have been identified, based on comparison to reference data in the literature, as those belonging to nitrogen in a four-bond arrangement and nitrogen in a three-bond arrangement, independent of hybridization. The formation of a fourth bond allows nitrogen to substitute for C atoms in a carbon-based graphitic system without the formation of dangling bonds or unfilled states. The relationship between nitrogen incorporation in a carbon-based ring structure and measured film properties is rationalized based on previously published models. (C) 1999 American Institute of Physics. [S0003-6951(99)00122-9].
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页码:3290 / 3292
页数:3
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