Segregation of Si and Ti in α-alumina

被引：11

作者：

Kebbede, A ^{[1
]}

Carim, AH ^{[1
]}

机构：

[1] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA

来源：

MATERIALS LETTERS | 1999年 / 41卷 / 04期

关键词：

alumina; segregation; titania; silicon; anisotropic; EDS;

D O I：

10.1016/S0167-577X(99)00130-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The segregation of Si and Ti in 0.6 wt.% TiO2-doped alpha-Al2O3 containing similar to 0.05 wt.% impurity Si was characterized. The material developed an anisotropic microstructure consisting of alumina platelets in an equiaxed matrix. Si collects to form an amorphous aluminosilicate layer at basal boundaries of platelets, but little Si is present at any other grain boundaries. Ti segregates preferentially to the faceted or curved edge boundaries of platelets, with a concentration there that is nearly three times as high as at basal surfaces. Ti segregation to boundaries between equiaxed grains was intermediate and showed no significant or systematic boundary-to-boundary variation. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：198 / 203

页数：6

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