Performance Under Thermal and Hydrothermal Condition of Amorphous Silica Membrane Prepared by Chemical Vapor Deposition

被引：16

作者：

Akamatsu, Kazuki ^{[1
]}

Nakane, Masataka ^{[1
]}

Sugawara, Takashi ^{[1
]}

Nakao, Shin-ichi ^{[1
]}

机构：

[1] Univ Tokyo, Dept Chem Syst Engn, Bunkyo Ku, Tokyo 1138656, Japan

来源：

AICHE JOURNAL | 2009年 / 55卷 / 08期

关键词：

silica membrane; chemical vapor deposition; hydrogen; thermal stability; hydrothermal stability; PERMEATION CHARACTERISTICS; HYDROGEN SEPARATION; HIGH-TEMPERATURE; REACTOR; CYCLOHEXANE; STABILITY; STEAM;

D O I：

10.1002/aic.11788

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

[No abstract available]

引用

页码：2197 / 2200

页数：4

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