The pi/2 side-reflection Laue technique and the new chart

被引:3
作者
Park, YH [1 ]
Yeom, HY [1 ]
Yoon, HG [1 ]
Kim, KW [1 ]
机构
[1] POSTECH,POHANG ACCELERATOR LAB,POHANG 790784,SOUTH KOREA
关键词
D O I
10.1107/S0021889897000721
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
For the capability of dynamic studies of structural changes of crystals under the environment of heat, electric or magnetic field, the pi/2 side-reflection Laue technique is performed in which the X-ray source, the specimen and the film are aligned along an L-shaped track. A new chart has also been designed for the analysis of pi/2 side-reflection Laue patterns. This new chart is applied to the analysis of crystal orientation in the pi/2 side-reflection Laue technique and to indexing the planes of simultaneous multiple-reflection images in Berg-Barrett topography. Also, the equation of zonal trace has been derived for depicting the zonal curves of configurations of pi/2 side-reflection spots and confirming the results which are analyzed by the new chart.
引用
收藏
页码:456 / 460
页数:5
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