Plasma absorption probe for measuring electron density in an environment soiled with processing plasmas

被引:182
作者
Kokura, H [1 ]
Nakamura, K [1 ]
Ghanashev, IP [1 ]
Sugai, H [1 ]
机构
[1] Nagoya Univ, Dept Elect Engn, Nagoya, Aichi 4648603, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 9A期
关键词
plasma absorption probe; plasma oscillation method; surface wave resonance; Langmuir probe; electron density; network analyzer;
D O I
10.1143/JJAP.38.5262
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, we describe a novel and simple technique for measuring electron density using. a plasma absorption probe (PAP). PAP enables us to measure the local absolute electron density even when the probe surface is soiled with processing plasmas. The technique relies on the resonant absorption of surface waves (SWs) elicited in a "cavity" at the probe head. The PAP consists of a small antenna connected with a coaxial cable and is enclosed in a tube (dielectric constant epsilon) inserted in a plasma (electron plasma frequency omega(p)). A network analyzer feeds a rf signal to the antenna and displays the frequency dependence of the power absorption. A series of resonant absorptions are observed at frequencies slightly above the SW resonance frequency omega(sw) = omega(p)/(1 + epsilon)(1/2), which allows us to determine the electron density. The measured electron densities are in good agreement with the data obtained by the plasma oscillation method.
引用
收藏
页码:5262 / 5266
页数:5
相关论文
共 7 条
[1]   A NEW TECHNOLOGY FOR NEGATIVE-ION DETECTION AND THE RAPID ELECTRON COOLING IN A PULSED HIGH-DENSITY ETCHING PLASMA [J].
AHN, TH ;
NAKAMURA, K ;
SUGAI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1995, 34 (10B) :L1405-L1408
[2]   Low temperature growth of amorphous and polycrystalline silicon films from a modified inductively coupled plasma [J].
Goto, M ;
Toyoda, H ;
Kitagawa, M ;
Hirao, T ;
Sugai, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (6A) :3714-3720
[3]  
NAKAMURA K, 1998, B AM PHYS SOC, V43, P1416
[4]   Comparison of electron density measurements in planar inductively coupled plasmas by means of the plasma oscillation method and Langmuir probes [J].
Schwabedissen, A ;
Benck, EC ;
Roberts, JR .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02) :119-129
[5]  
SCHWABEDISSEN A, 1999, IN PRESS PLASMA SOUR
[6]   PLASMA OSCILLATION METHOD FOR MEASUREMENTS OF ABSOLUTE ELECTRON-DENSITY IN PLASMA [J].
SHIRAKAWA, T ;
SUGAI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (11A) :5129-5135
[7]   SPACE CHARGE WAVES IN CYLINDRICAL PLASMA COLUMNS [J].
TRIVELPIECE, AW ;
GOULD, RW .
JOURNAL OF APPLIED PHYSICS, 1959, 30 (11) :1784-1793