Nanostructuring of polymers by hot embossing lithography

While researchers of ever more advanced NGL systems are still struggling to demonstrate the feasibility to manufacture features well below 100 nm at an affordable cost and a reasonable throughput, nanoimprint technologies are emerging as a possible answer to these challenges. 100 nm patterns are imprinted with a fully patterned 4 inch diameter stamp in a low-temperature embossing process. In low temperature imprinting processes with polymers having very low glass transition temperatures heating and cooling cycles are minimized. This enables to increase the throughput of a hot embossing process, which is important for potential industrial applications.