Atomic resolved imaging of cleaved NiO(100) surfaces by NC-AFM

被引：53

作者：

Hosoi, H ^{[1
]}

Sueoka, K

Hayakawa, K

Mukasa, K

机构：

[1] JST, CREST, Sapporo, Hokkaido 0608628, Japan

[2] Hokkaido Univ, Grad Sch Engn, Nanoelect Lab, Sapporo, Hokkaido 0608628, Japan

来源：

APPLIED SURFACE SCIENCE | 2000年 / 157卷 / 04期

关键词：

non-contact; atomic force microscope; nickel oxide;

D O I：

10.1016/S0169-4332(99)00529-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We have observed the cleaved NiO(100) surface by means of the UHV non-contact atomic force microscopy (NC-AFM). Atomically resolved NC-AFM images of NiO(100)-cleaved surface has successfully obtained with atomically distinguishable defects at room temperature. The distance of the observed periodic protrusions is about 4.2 Angstrom and the periodicity corresponds to that of sublattice of NiO single crystal. (C) 2000 Published by Elsevier Science B.V. All rights reserved.

引用

页码：218 / 221

页数：4

共 14 条

[1]

BAMMERLIN M, 1997, PROBE MICROSCOPY, V1, P3

[2] Unexpected differences in the surface electronic structure of NiO and CoO observed by STM and explained by first-principles theory [J].