Deposition of Carbon Nanowall Flowers on Two-Dimensional Sheet for Electrochemical Capacitor Application

被引：44

作者：

Hung, Tsung-Chi ^{[1
]}

Chen, Chia-Fu ^{[2
]}

Whang, Wha-Tzong ^{[1
]}

机构：

[1] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30050, Taiwan

[2] Ming Dao Univ, Dept Mat Sci & Engn, Changhua 52345, Taiwan

来源：

ELECTROCHEMICAL AND SOLID STATE LETTERS | 2009年 / 12卷 / 06期

关键词：

capacitance; carbon; electrochemical electrodes; nanofabrication; nanostructured materials; plasma CVD;

D O I：

10.1149/1.3099325

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

We have used bias-assisted microwave plasma chemical vapor deposition to synthesize (i) two-dimensional carbon nanowalls [(2D CNWs), monolayer] and (ii) three-dimensional carbon nanowalls [(3D CNWs), double-layer] on carbon cloth in a CH4/CO2 system. The specific surface area of the 3D CNW electrode (1580 m(2)/g) was considerably larger than that of the 2D CNW electrode (364 m(2)/g). This higher surface area and more porous structure of the 3D CNW electrode resulted in its capacitance reaching as high as ca. 198 F/g at a scan rate of 10 mV/s. Electrochemical measurements suggested that this 3D electrode is a promising material for application in electrical storage devices.

引用

页码：K41 / K44

页数：4

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