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Integration of Pb(Zr0.52Ti0.48)O3 epilayers with Si by domain epitaxy
被引:34
作者:
Sharma, AK
[2
]
Narayan, J
Jin, C
Kvit, A
Chattopadhyay, S
Lee, C
机构:
[1] N Carolina Agr & Tech State Univ, Dept Elect Engn, Greensboro, NC 27411 USA
[2] N Carolina State Univ, NSF Ctr Adv Mat & Smart Struct, Dept Mat Sci & Engn, Raleigh, NC 27695 USA
关键词:
D O I:
10.1063/1.126063
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
High-quality lead zirconate titanate films (PZT) have been grown on yttrium barium copper oxide (YBCO) bottom electrode by domain epitaxy where integral multiples of lattice constants match across the interface. The YBCO films were epitaxially fabricated on Si (100) by introducing epilayer geometry of strontium titanate/magnesium oxide/titanium nitride. Pulsed-laser ablation was used to evaporate these five stoichiometric targets in a high vacuum chamber. X-ray diffraction and high-resolution transmission electron microscopy techniques were employed to gain understanding of the structure, crystallinity, and interfaces in these epilayers. The electrical characterization of the PZT films with evaporated silver contacts resulted in superior values of spontaneous polarization, remnant polarization, and coercive fields. This heterostructure opens a way for integration of epitaxial single-crystal PZT-based capacitors with silicon-based devices. (C) 2000 American Institute of Physics. [S0003-6951(00)01711-3].
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页码:1458 / 1460
页数:3
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