The reaction mechanism of nitridation of alpha-gallium oxide ((alpha-Ga(2)O(3)) to gallium nitride (GaN) under a flow of ammonia was deduced by observing the change in morphology of alpha-Ga(2)O(3) powder coated with silicon substrate at an increasing reaction temperature. Upon their complete nitridation to GaN below 1000 degrees C, the morphology of alpha-Ga(2)O(3) powder was retained. This strongly indicates that the conversion of alpha-Ga(2)O(3) to GaN does not proceed through any gaseous intermediate but solid-state intermediates of gallium oxynitrides (GaO(x)N(y)). The occurrence of the intermediates was also evidenced by the change in weights of products with increasing the reaction temperature and by comparison of XRD patterns and (71)Ga magic-angle spinning (MAS) NMR spectra of incomplete nitrided samples before and after oxidation. (c) 2006 Elsevier B.V. All rights reserved.
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Koleske, DD
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Wickenden, AE
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Wickenden, AE
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Henry, RL
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Henry, RL
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Culbertson, JC
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Culbertson, JC
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Twigg, ME
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Koleske, DD
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Wickenden, AE
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Wickenden, AE
;
Henry, RL
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Henry, RL
;
Culbertson, JC
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA
Culbertson, JC
;
Twigg, ME
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USN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USAUSN, Res Lab, Lab Adv Mat Synth, Elect Sci & Technol Div, Washington, DC 20375 USA