Reaction mechanism of the nitridation of α-gallium oxide to gallium nitride under a flow of ammonia

被引:19
作者
Jung, Woo-Sik [1 ]
机构
[1] Yeungnam Univ, Sch Chem Engn & Technol, Kyongsan 712749, South Korea
关键词
gallium oxide; gallium nitride; reaction mechanism; gallium oxynitrides;
D O I
10.1016/j.matlet.2006.02.022
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
The reaction mechanism of nitridation of alpha-gallium oxide ((alpha-Ga(2)O(3)) to gallium nitride (GaN) under a flow of ammonia was deduced by observing the change in morphology of alpha-Ga(2)O(3) powder coated with silicon substrate at an increasing reaction temperature. Upon their complete nitridation to GaN below 1000 degrees C, the morphology of alpha-Ga(2)O(3) powder was retained. This strongly indicates that the conversion of alpha-Ga(2)O(3) to GaN does not proceed through any gaseous intermediate but solid-state intermediates of gallium oxynitrides (GaO(x)N(y)). The occurrence of the intermediates was also evidenced by the change in weights of products with increasing the reaction temperature and by comparison of XRD patterns and (71)Ga magic-angle spinning (MAS) NMR spectra of incomplete nitrided samples before and after oxidation. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:2954 / 2957
页数:4
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