Substrate dependence of large ordinary magnetoresistance in sputtered Bi films

被引:13
作者
Hsu, JH
Sun, YS
Wang, HX
Kuo, PC
Hsieh, TH
Liang, CT
机构
[1] Natl Taiwan Univ, Dept Phys, Spintron Lab, Taipei 106, Taiwan
[2] Natl Taiwan Univ, Ctr Nanostorage Res, Taipei 106, Taiwan
[3] Natl Taiwan Univ, Dept Mat Engn, Taipei 106, Taiwan
关键词
magnetoresistance; bismuth; Shubnikov de-Haas oscillation; sputtering;
D O I
10.1016/j.jmmm.2003.12.743
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The Bi films of different crystalline orientations can be obtained from growing on selected substrates such as Si(1 0 0), Si(1 10), and Si(1 1 1), which are prepared with DC sputtering followed by post-annealing at 267degreesC for 8 h. Besides, the positive large ordinary magnetoresistance effect is shown to be highly anisotropic. We have also observed distinct oscillation periods of Shubnikov de-Haas oscillations at low temperatures. This is due to the different orientation of the cyclotron orbits with respect to the films. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1769 / 1771
页数:3
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