Shadow nanosphere lithography: Simulation and experiment

被引：323

作者：

Kosiorek, A

Kandulski, W

Chudzinski, P

Kempa, K

Giersig, M ^{[1
]}

机构：

[1] CAESAR, Bonn, Germany

[2] Poznan Univ Tech, Poznan, Poland

[3] Boston Coll, Chestnut Hill, MA 02467 USA

来源：

NANO LETTERS | 2004年 / 4卷 / 07期

关键词：

D O I：

10.1021/nl049361t

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

In this letter we describe the preparation of large-area, two-dimensional metallic structures using shadow nanosphere lithography. By varying the position of the substrate with respect to the evaporation source during the sample preparation, we make morphologies such as cups, rods, and wires, that are not accessible by the standard nanosphere lithography. This technique also allows for an encapsulation of the metallic structures, to prevent them from oxidation. Morphologies predicted by our computer simulations have been subsequently confirmed experimentally.

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收藏

页码：1359 / 1363

页数：5

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