Amorphous Si TFTs on plastically deformed spherical domes

被引:21
作者
Hsu, PI [1 ]
Gleskova, H [1 ]
Huang, M [1 ]
Suo, Z [1 ]
Wagner, S [1 ]
Sturm, JC [1 ]
机构
[1] Princeton Univ, Ctr Photon & Optoelect Mat POEM, Princeton, NJ 08544 USA
关键词
D O I
10.1016/S0022-3093(01)01156-5
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
There is a growing interest in the design and fabrication of flexible and rugged electronics particularly for large-area displays and sensor arrays. In this work, we describe the fabrication of amorphous silicon (a-Si:H) thin film transistors (TFTs) on a Kapton' substrate which can be permanently deformed into a spherical cap shape. This level of strain would crack uniform a-Si:H device films. To prevent fractures in our TFT structure. the silicon and silicon nitride layers of the TFTs are patterned to create isolated device islands. After deformation, these brittle islands can remain crackfree, and the TFTs achieve comparable device behavior despite average strain in the substrate in excess of 5%. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1355 / 1359
页数:5
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