Nonspecular scattering from extreme ultraviolet multilayer coatings

We review our recent studies of nonspecular scattering from multilayer coatings designed for high reflectivity in the wavelength range of 1-100 nm. A linear, continuum growth model is used to describe the structure of the interfacial roughness in the multilayer coatings. This model accounts for both the partial replication of the substrate roughness and che intrinsic roughness introduced by the multilayer growth. The scattering of radiation from the roughness is calculated within the distorted-wave Born approximation and is compared to experimental measurements. Observations of particular interest are: (1) enhanced nonspecular scattering from the correlated roughness of the coatings and (2) asymmetry in the measured scattering due to phase effects produced by an off-normal angle of deposition during film growth. As an application of our results we consider the effect of nonspecular scattering in EUV lithography. (C) 2000 Elsevier Science B.V. All rights reserved.