Cathodoluminescence versus dynamical epitaxy of Ba-ion irradiated α-quartz

被引:13
作者
Dhar, S
Gaasiorek, S
Sahoo, PK
Vetter, U
Hofsäss, H
Kulkarni, VN
Lieb, KP
机构
[1] Univ Gottingen, Inst Phys 2, D-37077 Gottingen, Germany
[2] Henryk Niewodniczanski Inst Nucl Phys, PL-31342 Krakow, Poland
[3] Indian Inst Technol, Dept Phys, Kanpur 208016, Uttar Pradesh, India
关键词
D O I
10.1063/1.1784538
中图分类号
O59 [应用物理学];
学科分类号
摘要
Doping alpha-quartz with photoactive ions without destroying its crystalline structure appears to be a promising way to tune its luminescent and structural properties. We have achieved dynamic solid phase epitaxial regrowth and cathodoluminescence of 175 keV Ba-ion irradiated alpha-quartz in the temperature range from 300 to 1170 K. Rutherford Backscattering Channeling analysis showed that the amorphous layer produced by 1 x 10(15) Ba ions/cm(2) at 300 K had almost disappeared at an implantation temperature of 1123 K. Room temperature cathodoluminescence exhibited dramatic changes in the optical spectra as a function of the implantation temperature and allowed to distinguish between color centers related to quartz, ion-irradiated silica and implanted Ba. Between 770 and 1100 K, room-temperature cathodoluminescence showed a predominant blue and other weak bands connected to various known defects in the =Si-O-Si= network. However, after achieving almost complete solid phase epitaxial recovery, only a violet band at 3.4 eV remained, which we attribute to Ba-related luminescence centers. (C) 2004 American Institute of Physics.
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页码:1341 / 1343
页数:3
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